Controlling the Dimensions of Nano-structured Materials Using Fib Sem

Techniques for characterization and methods for fabrication at the nano-scale are becoming more powerful, giving new insights into the spatial relationships between nanostructures and greater control over their development. A case in point is the application of state-of-the-art focused ion beam technology (FIB), in combination with high-performance scanning electron microscopy (SEM), giving the ability to use either ions or electrons to perform advanced nanofabrication, via sputtering or chemical vapor deposition. For example, Figure 1 shows a photonic array, milled into silicon using a focused gallium ion beam and subsequently imaged with an electron beam.